Continuous
Cleaning: Continuous cleaning involves a technique
of applying the high frequency energy to the work piece at
a constant rate until all cleaning is accomplished. The electrode
is moved over the surface of the material until all oxides
or contaminants are removed.
Burst Cleaning: Burst
cleaning allows for more aggressive surface cleaning with minimal
heat transferred into the work piece. This technique involves activating
and de-activating the switch several times through the process.
The RPC10 is designed so that repeated cleaning action can be initiated
immediately as long as the postflow time has not elapsed. Therefore,
an operator can pulse the high frequency on and off in real time. |
Burst cleaning
is most effective when used on small components that cannot tolerate
a lot of heat input, but have a significant amount of surface contaminant
or oxide. For example, continuous cleaning at 4.00 amps on a small component
may actually melt the material. However, it can be burst cleaned at this setting
without damaging the component.
There are other variables besides current that will effect the cleaning process.
The area cleaned will be proportional to the gas cup orifice size. Therefore,
changing gas cups can control the area being cleaned. Also, more aggressive
cleaning action can be accomplished by increasing the gas flow rate. Finally,
gas composition can be changed to influence the cleaning. Normally, argon is
used. Introducing a small amount of hydrogen into the argon will make the cleaning
more aggressive as well.
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